Non-grafted Maxillary Sinus Floor Elevation With Simultaneous Implant Placement Using Different Implant Lengths

Cairo University0 sites20 target enrollmentJanuary 1, 2019

ConditionsMaxillary Sinus Lift

Overview

Phase: Not Applicable
Intervention: Not specified
Conditions: Maxillary Sinus Lift
Sponsor: Cairo University
Enrollment: 20
Primary Endpoint: height of gained bone
Last Updated: 7 years ago

Overview Investigators Eligibility Criteria Outcomes Similar Trials

Overview

Brief Summary

twenty recruited patients indicated for sinus augmentation and simultaneous implant placement will be divided into two groups (10 in each of the groups).to evaluate & compare bone formation & implant stability after shneiderian membrane elevation and augmentation with graft less tenting technique with different implant lengths.

group one will receive 8mm implant lenght while group two will receive 10mm implants.

Registry

clinicaltrials.gov

Start Date

January 1, 2019

End Date

August 15, 2019

Last Updated

7 years ago

Study Type

Interventional

Study Design

Parallel

Sex

All

Investigators

Sponsor

Cairo University

Responsible Party

Principal Investigator

Ahmed Abdulnasser

principal investigator

Cairo University

Eligibility Criteria

Inclusion Criteria

•patient with atrophic maxilla \& pneumatized maxillary sinus with residual bone height at least 4mm of residual ridge
•both sexes

Exclusion Criteria

•patients with systematic diseases that may affect normal healing
•sinus pathology
•heavy smokers more than 20 cigarettes per day

Outcomes

Primary Outcomes

height of gained bone

Time Frame: 6 months post operative

two cone beam CT will be done for the patients, one immediate post operative \& the other 6 months post operative then the amount of gained bone will be assessed by superimposing the same section in the two cone beam CT.

Secondary Outcomes

implant stability(will be measured intra operative after implant insertion and will be measured once more 6 months post operative after the first operation at the time of implant exposure)