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临床试验/IRCT20220205053946N1
IRCT20220205053946N1已完成未知

Influence of postoperative low-level laser therapy using laser diode 940 nm on crestal bone levels around dental implants

Arak University of Medical Sciences0 个研究点目标入组 9 人开始时间: 待定最近更新:
适应症

试验速览

阶段
未知
状态
已完成
入组人数
9

研究概览

简要总结

暂无简介。

研究设计

研究类型
Interventional

入排标准

年龄范围
20 years 至 55 years(—)
性别
All

入选标准

  • The applicants of implant treatment that two-sided in a jaw in a similar area have lost tooth. tooth extraction at least 6 months before implant surgery; nongrafted implant site; type 2 or 3 bone quality according to the Lekholm and Zarb classification, adequate space with buccolingual width of minimum 6 mm and mesiodistal width of minimum 7 mm; inter-occlusal distance greater than 7 mm.

排除标准

  • Pregnant women. Any mental illness and psychological and behavioral conditions, which is the absolute contraction of implant treatment. Any systemic illness that contraindicates surgery; uncontrolled diabetes mellitus; bisphosphonate therapy; history of radiotherapy in the maxillofacial region within last 12 months; smoking; para-functional habits; poor oral hygiene with full mouth plaque score and full mouth bleeding score =25%, periodontally compromised patients with attachment loss =3 mm, and/or radiographic bone loss =30% of root length in =30% of sites and those who refused to return for follow-up were excluded from this study.

研究者

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