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摘要
临床试验
审批记录
专利
每项发明一条,涵盖美国、欧洲、PCT 与中国的同族专利。
COMPOUND, POLYMERIZABLE COMPOSITION, HOLOGRAM RECORDING MEDIUM, POLYMER, OPTICAL MATERIAL, AND OPTICAL COMPONENT
US 20260028312 A1
申请人: MITSUBISHI CHEM CORP
优先权: 2023
CN
EP
US
WO
4 件公开
SKIN CLEANSER COMPOSITION
EP 4623894 A1
申请人: KAO CORP
优先权: 2022
CN
EP
WO
3 件公开
RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT
US 20260003267 A1
申请人: JSR CORP
优先权: 2023
CN
US
WO
3 件公开
RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND
US 20260063994 A1
申请人: JSR CORP
优先权: 2023
CN
US
WO
3 件公开
US 20260079396 A1
申请人: JSR CORP
优先权: 2023
CN
US
WO
3 件公开
MIXED POWDER FOR ORGANIC ELECTROLUMINESCENT ELEMENT AND METHOD FOR MANUFACTURING MIXED POWDER, METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT ELEMENT USING MIXED POWDER, METHOD FOR SELECTING COMPOUND IN MIXED POWDER, AND COMPOSITION FOR VACUUM DEPOSITION
WO 2022270423 A1
申请人: IDEMITSU KOSAN CO
优先权: 2021
CN
WO
3 件公开
Modification of Factor VIII
US 2011306551 A1
申请人: ZUNDEL MAGALI
优先权: 2010
CN
US
2 件公开
THIENO-INDENO-MONOMERS AND POLYMERS
WO 2018104367 A3
申请人: BASF SE
优先权: 2016
CN
WO
2 件公开
Monomer mixture for producing a dental material
US 12186416 B2
申请人: MUEHLBAUER TECH GMBH
优先权: 2021
CN
US
2 件公开
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND INTERMEDIATE THEREOF
US 20260050211 A1
申请人: TOKYO OHKA KOGYO CO LTD
优先权: 2022
US
WO
2 件公开
RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND ONIUM SALT COMPOUND
WO 2024241766 A1
申请人: JSR CORP
优先权: 2023
CN
WO
2 件公开
WO 2025070124 A1
申请人: JSR CORP
优先权: 2023
CN
WO
2 件公开
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