IRCT20220205053946N1已完成未知
Influence of postoperative low-level laser therapy using laser diode 940 nm on crestal bone levels around dental implants
适应症
试验速览
- 阶段
- 未知
- 状态
- 已完成
- 入组人数
- 9
研究概览
简要总结
暂无简介。
研究设计
- 研究类型
- Interventional
入排标准
- 年龄范围
- 20 years 至 55 years(—)
- 性别
- All
入选标准
- •The applicants of implant treatment that two-sided in a jaw in a similar area have lost tooth. tooth extraction at least 6 months before implant surgery; nongrafted implant site; type 2 or 3 bone quality according to the Lekholm and Zarb classification, adequate space with buccolingual width of minimum 6 mm and mesiodistal width of minimum 7 mm; inter-occlusal distance greater than 7 mm.
排除标准
- •Pregnant women. Any mental illness and psychological and behavioral conditions, which is the absolute contraction of implant treatment. Any systemic illness that contraindicates surgery; uncontrolled diabetes mellitus; bisphosphonate therapy; history of radiotherapy in the maxillofacial region within last 12 months; smoking; para-functional habits; poor oral hygiene with full mouth plaque score and full mouth bleeding score =25%, periodontally compromised patients with attachment loss =3 mm, and/or radiographic bone loss =30% of root length in =30% of sites and those who refused to return for follow-up were excluded from this study.
研究者
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